Report:DialogClassic and Classic Web/Viewing Results/Viewing Patent Citations
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Viewing Patent Citations
Patent related files on Dialog will display citations inline with the text when a record is viewed. The screenshots below depict the way in which citations are displayed when viewing records in the IFI Claims database.
Citations are often broken up by inventor citations, examiner citations, foreign citations, etc depending on which database is queried. As seen in the screenshot below from the IFI Claims database, the foreign citations are presented in a separate list.
One dedicated way of viewing patent citations on Dialog is to search within the Patent Citations Index (PCI) (File 342). This file, which is produced by Thomson Reuters, contains citations from over 7.8 million patent families. Both forward and backward citations made by both the examiner as well as those cited by the inventor were originally included with each record. Sometime after the PCI file was introduced, however, collecting the applicant citations proved to be too arduous a task and they were dropped. Currently, only examiner citations from formal search reports are included in the PCI file. Importantly, each record in the Patent Citations Index is a single patent family representing one invention. This patent family data comes from the family data in the Derwent World Patents Index (DWPI) at the time that the most recent citations were added to the database. 
Examiner citations are provided for family members sourced from the following patent issuing authorities: Belgium (BE), European Patent Office (EP), France (FR), Germany (DE), Japan (JP), Netherlands (NL), Spain (ES), United Kingdom (GB), United States (US), and the World Intellectual Property Organization (WIPO), which administers the Patent Cooperation Treaty applications (WO/PCT).
Many competing systems feature hyperlinked citations for quick navigation to the cited document. Unfortunately, Dialog Classic does not offer this type of feature.
- ↑ Adams, Stephen R. 2006. Information Sources in Patents. 2nd Edition. Munich: K.G. Saur.